Intel was the first in the world to order ASML's most advanced EUV lithography machine

On January 19, Intel announced that it was the first to order the ASML TWINSCAN EXE:5200 lithography machine. TWINSCAN EXE:5200 is an ASML high NA (numerical aperture) EUV lithography machine with a throughput of more than 220 wafers per hour (wph). From the roadmap, EXE:5200 is expected to be put into use as soon as the end of 2024, and will be applied to the production of advanced chips on a large scale in 2025.

Four years ago, ASML's first generation of high NA (0.55 NA) lithography machine EXE:5000, Intel was the first company to place an order. However, the current 7nm, 5nm chips are not its production, but 0.33NA EUV lithography machine.

Edited by the Institute of Core Research

Compared with the 0.33NA lithography machine, the resolution of 0.55NA is upgraded from 13nm to 8nm, which can expose more complex integrated circuit patterns faster and better, breaking through the limit of 0.33NA single composition 32nm to 30nm spacing. The outside world expects that the first generation of high-NA lithography machine EXE:5000 will be the first to be used for 3nm nodes, as for EXE:5200, according to Intel's process roadmap, 2025 is at least 20A or 18A, that is, 5nm and 5nm+.

Previously, an ASML spokesperson had revealed to the media that higher lithography resolution would allow the chip to shrink by 1.7 times and increase the density by 2.9 times. In the future, more advanced processes than 3nm will rely heavily on high-NA EUV lithography machines. Intel was able to grab the first order, in addition to working closely with ASML, but also because it has a sufficient budget. Gartner analyst Alan Priestley said the price of the next-generation EUV lithography machine at 0.55 NA will double to $300 million (about 1.9 billion yuan).

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