After TSMC previously purchased EUV (Extreme Ultraviolet Light) microscopy system equipment, Intel and ASML today jointly announced that they will take the lead in purchasing the latest EUV equipment for the next generation, High-NA, and plan to introduce mass production in 2025.
According to today's joint press release, Intel and ASML have strengthened their cooperation to promote the production of High-NA in 2025, which is Intel's first and first order of ASML's TWINSCAN EXE:5200 system, marking a key step.
ASML did not disclose which semiconductor factory took the lead in adopting the next generation of EUV, but since 2018, it has received four new generation High-NA EUV (TWINSCAN EXE: 5000) orders, which were named by the industry as the first ordered by TSMC.
Today, Intel is the first to purchase the TWINSCAN EXE:5200, allowing ASML to receive a new high-NA EUV order.
![ASML: 6 Key Steps in Chip Manufacturing[fig]](data:image/gif;base64,R0lGODlhAQABAIAAAP///wAAACwAAAAAAQABAAACAkQBADs=)