Zhongwei Company revealed the latest details of MOCVD equipment for MiniLED mass production

At the recent "SSLCHINA 2021: Mini/Micro LED Technology Industry Application Forum", Hu Jianzheng, Director of MOCVD Process Technology of Zhongwei Semiconductor Equipment (Shanghai) Co., Ltd., shared the latest progress of Prismo UniMax, a MOCVD device for blue-green light MiniLED production.

Hu Jianzheng introduced that compared with the traditional LED used for lighting, Mini/Micro LED has more stringent requirements for wavelength uniformity and particle number of epitaxial sheets, and it is necessary to develop a new MOCVD platform to improve the wavelength uniformity of epitaxial sheets and reduce the number of particles, so as to realize the commercial application of Mini/Micro LED.

Prismo UniMax, a newly developed MOCVD platform for large-scale production of MiniLED, achieves good wavelength uniformity through fine regulation of local temperature fields and optimization of flow fields, and blue-green LEDs grown on 4" and 6" substrates. In the 41×4" configuration, the wavelength uniformity of the blue LED in-chip and between-chip is also very high, 0.71 nm and 0.87 nm (1σ), respectively, and in the 10×6" configuration, the wavelength uniformity of the blue LED on-chip reaches 0.84 nm (1σ), and the maximum minimum wavelength difference between 100 mm × 100 mm square piece is as low as 2.4 nm. For a 6-inch green LED with an average wavelength of 530 nm, the on-chip wavelength uniformity is 1.04 nm (1σ), and the maximum minimum difference between the wavelength of the 100 mm × 100 mm square piece is only 4.6 nm.

From the official website of Micro And micro, it is learned that in terms of configuration, Prismo UniMaxMOCVD equipment has up to 4 reaction chambers, which can simultaneously process 108 4-inch or 40 6-inch high-performance gallium nitride-based blue-green light MiniLED epitaxial wafers, which can be extended to 164 4-inch or 72 6-inch epitaxial wafers at the same time through the adjustment of graphite discs, and its process capabilities can also be extended to grow 8-inch epitaxial wafers. In addition, the equipment is equipped with a 785mm large-diameter graphite tray, which greatly increases the equipment capacity and effectively reduces the production cost of MiniLED epitaxial wafers.

Image source: Zhongwei Semiconductor Equipment official website

It is reported that the Prismo UniMaxMOCVD device was officially released in June this year, mainly for the mass production of gallium nitride (GaN)-based MiniLED epitaxial wafers. On December 9, Zhongwei announced that the prismo UniMaxMOCVD equipment order has exceeded 100 cavities.

It is understood that Zhongwei Semiconductor Equipment Co., Ltd. was established in 2004, headquartered in Shanghai, listed on the Science and Technology Innovation Board of the Shanghai Stock Exchange in 2019, mainly engaged in the research and development, production and sales of high-end semiconductor equipment and pan-semiconductor equipment, the company's product distribution is: CCP etching equipment, ICP etching equipment, deep silicon etching equipment, MOCVD equipment, VOC purification equipment.

Among them, the Prismo series OFCVD equipment developed by Zhongwei can be widely used in the production of various devices based on group III nitrides, including blue-green LEDs, deep ultraviolet LEDs and power devices. At present, Zhongwei's MOCVD equipment has been fully put into mass production on the main LED production lines in the industry.

In 2020, Zhongwei achieved operating income of 2.273 billion yuan, an increase of 16.76% year-on-year, and net profit attributable to shareholders of listed companies was 492 million yuan, an increase of 161.02% year-on-year. In the first half of 2021, the operating income of Zhongwei was 1.339 billion yuan, an increase of 36.82% year-on-year, and the net profit attributable to shareholders of listed companies was 397 million yuan, an increase of 233.17% year-on-year. (LeDinside)