【Process】The basic process of MEMS manufacturing - etching process (wet method) This paper studies the wet chemical etching process of aluminum layer in semiconductor chip manufacturing, and proposes an observation of aluminum layer cut-off

【Process】The basic process of MEMS manufacturing - etching process (wet process)

In this paper, the wet chemical etching process of aluminum layer in semiconductor chip manufacturing is studied, and a method for observing the cross-section of aluminum layer is proposed, which is applied to the observation of static etchants. The observations show that the amount of etching of the aluminum layer increases over time, but the increment decreases. At the same time, an increase in the width of the resist leads to an increase in the amount of lateral etching. The numerical simulation results are consistent with the observation results, indicating that the simulation can effectively predict the geometry of the etched section. In addition, wet etching of silicon, silica and silicon nitride is introduced.