Nanda Optoelectronics: ArF photoresist is certified at multiple technical nodes at the same time, and has not yet involved 14nm technology nodes

Jiwei Network news, on January 7, Nanda Optoelectronics said on the investor interaction platform that at present, ArF photoresist is certified at multiple technical nodes at the same time, and has not yet involved 14nm technology nodes.

Nanda Optoelectronics also said that the company's MO source and electronic special gas product orders are in a saturated state. ArF photoresist can be used in integrated circuit manufacturing processes at the 90nm-14nm technology node. The company's current products include dry photoresist and immersion photoresist.

In terms of MO source, in addition to making progress in the research and development of MO source 2.0, the company has increased its research and development efforts in high-purity, low-silicon and low-oxygen trimethyl aluminum, and has also made key progress, laying the foundation for the upgrading and transformation of the MO source business from LED to IC and new energy industry. In terms of precursors, in addition to the development and industrialization of customized products, it is also necessary to develop and industrialize the silicon precursor patents purchased from DuPont Group last year, and the progress is currently smooth.

In terms of electronic special gas, the latest upgraded ultra-high purity arsenic product quality has exceeded the current technical level of international advanced peers in the test of downstream customers, and ultra-high purity phosphine products have entered the world's first-class process chip enterprises, marking that the company's hydrogen electronic special gas has leapt to the forefront of the world. The research and development progress in mixed gas is also relatively good, and it is actively responding to the upgrading needs of the new energy industry and the semiconductor industry.

It is reported that in terms of quality control equipment for the photoresist business, Nanda Optoelectronics has purchased some testing equipment, including lithography machines, which are also used to detect photoresists, which belong to the detection of lithography performance, which is part of quality control. For others like purity and particle size detection, Nanda Optoelectronics is a special electronic material, and we have a deep technical foundation in the past. In terms of staffing, in order to better communicate with customers, we have hired experienced lithography engineers to manage the quality control part of the photoresist. In terms of photoresist raw materials, our strength of NTU Optoelectronics is to do synthesis, so it has the ability to synthesize monomers. Some monomers in some domestic enterprises have been industrialized, do not belong to the material of the card neck, we directly buy domestic; for some special, high-tech key monomers, by our own design, synthesis and preparation. Therefore, it can be said that the monomers of the preparation of photoresists have been localized.

(Proofreading/Andy)