The importance of lithography machines
Semiconductor chips are the cornerstone of modern technological development, permeating all aspects of our lives everywhere. From mobile phones, computers to automobiles, to aerospace and other cutting-edge fields, chips play an indispensable and important role without exception. And one of the key equipment for manufacturing chips is the mysterious and sophisticated lithography machine.
The lithography machine acts like a tiny 3D printer, precisely controlling the beam of light to engrave the circuit pattern layer by layer onto the silicon wafer, and finally build the intricate chip structure. Its performance directly determines the process level, integration and yield of the chip, and can be said to be the heart core of chip manufacturing.
With the continuous advancement of Moore's Law, the process technology of chips continues to advance to the nanometer and atomic levels, and the requirements for lithography machines are also increasing. At present, extreme ultraviolet lithography (EUV) technology is required for advanced processes of 7nm and below to achieve smaller linewidths and higher resolution. The core components of EUV lithography machines, such as light sources, objective lenses, and workbenches, are facing huge technical challenges and need to break through a number of bottlenecks.
The development of EUV lithography machines
The study of EUV lithography technology can be traced back to the early 90s of the 20th century. At that time, Intel and other companies jointly initiated the formation of EUV LLC to develop this new lithography technology, which was seen as the road to the future.
In 2010, Dutch lithography giant ASML successfully launched the world's first EUV lithography prototype NXE:3100 based on the research results of EUV LLC. Since then, ASML has continued to improve and upgrade EUV lithography machines, and has now launched 7 generations of products, with the latest NXE:3600D supporting 3nm advanced processes.
The development of EUV lithography machines has not been easy. Due to the long-term monopoly of its core components and process technology by European and American countries, Chinese mainland enterprises are severely restricted in obtaining this equipment. In order to break through this core technology, which is regarded as a "bottleneck", the Chinese government and scientific research institutions have invested a lot of money and manpower to start independent research and development of EUV lithography machines.
A breakthrough in the research and development of EUV lithography machine in China
After years of hard work, China has finally made a major breakthrough in the research and development of EUV lithography machines.
In April 2023, Tsinghua University successfully developed a new EUV light source called "SSMB", which can be used to drive EUV lithography machines. This technology breaks through the bottleneck of EUV light source and paves a key step for domestic EUV lithography machines.
Changchun Institute of Optics and Mechanical Engineering, Chinese Academy of Sciences, Harbin Institute of Technology and other units have also conquered the other two core technologies of EUV lithography machine: high-precision arc mirror system and ultra-high-precision vacuum double table. The former solves the manufacturing challenges of objective lenses, while the latter enables precise positioning at the nanometer level.
These breakthroughs mark a solid step forward in China's independent research and development of EUV lithography machines. With the independent and controllable EUV lithography machine, China's chip industry will no longer be "stuck", and it is expected to break through more advanced process technology in the future to help science and technology become self-reliant and self-reliant.
The improvement of the domestic lithography machine industry chain
In addition to breakthroughs in core technologies, China has also made great progress in improving the lithography machine industry chain.
Domestic lithography machine enterprises represented by Shanghai Microelectronics have the ability to mass produce lithography machines with 28nm and above processes. According to reports, Shanghai Microelectronics' 28nm immersion lithography machine will be launched by the end of 2023, marking the official entry of domestic lithography machines into the mass production stage.
A number of enterprises focusing on lithography machine parts have also emerged in China, such as Zhongke Kemei. They provide high-precision coating devices, optical components and other key components for domestic lithography machines, and strongly support the development of the entire industrial chain.
Compared with international giants, China's lithography machine industry is still in its infancy, and there is still a big gap in the advanced process of EUV and below. However, as long as we continue to maintain the momentum of innovation, it is not unattainable to break through higher technical barriers in the future and realize the true independence and controllability of chip manufacturing.
The national strategic significance of the chip industry
The reason why the chip industry has received so much attention is inseparable from its great significance to the national development strategy.
Semiconductor chips are regarded as the "food of the new era" and are the most basic elements to support economic and social operations. Once it is stuck in this field, it will have a huge impact on the country's information security, industrial development and scientific and technological innovation.
The Chinese government has elevated the chip industry to a national strategy, made every effort to promote independent innovation, and strived to achieve independence and controllability in chip manufacturing and design. Mastering key manufacturing equipment such as EUV lithography machines is undoubtedly the most important part.
Only with the chip industry chain with independent intellectual property rights can China truly stand in the world of science and technology and occupy the initiative in the future scientific and technological competition. The breakthrough of EUV lithography machine will give wings to the take-off of China's chip industry.
The road of scientific and technological innovation in the future
The breakthrough of EUV lithography machine is just a new starting point on the road of China's scientific and technological self-reliance and self-reliance.
With the continuous advancement of Moore's Law, 3nm, 2nm and even more advanced process technology is just around the corner. At that time, lithography technology will face higher requirements, requiring shorter wavelength light sources and higher resolution imaging systems.
China must continue to increase investment in scientific research, cultivate high-end talents, and promote basic research and original innovation in order to keep up with the pace of the world's scientific and technological development. It is also necessary to strengthen the collaboration between industry, university and research, promote the efficient transformation of scientific and technological achievements, and help scientific and technological innovation take root in practice.
This road is destined to be full of thorns and requires the joint efforts of the whole society. However, as long as we maintain our determination and never give up, one day, China's scientific and technological strength will keep pace with the world and contribute its wisdom and strength to the progress of human civilization.