SECS/GEM：PLC與MES間處理

SECS/GEM是由國際半導體裝置連接配接性标準。此連接配接性标準用于在裝置和工廠的資訊和控制系統間建立通訊。被定義為制造裝置實作通訊和控制的一般模型。一般來說，SECS/GEM标準定義了資訊、狀态機和情境，來讓工廠軟體能夠控制并監視制造裝置。

　　在實作SECS/GEM标準的工廠内，存在主機和裝置這兩方。由制造商（工廠）運作與裝置接口建立通訊的主機軟體。主機無需遵守完整的連接配接性标準，因為它隻設定裝置的預期行為。不過，若要使用接口，主機必須進行主機端通訊。SECS/GEM為每條可能的主機資訊設定了清晰的裝置預期行為。

SECS/GEM介紹

SECS/GEM定義半導體生産裝置與主機之間的通訊關系，通訊标準。SECS/GEM通訊規則如下圖，FAB負責MES進行控制整個工廠中的房間的生産。

裝置不需要關心SECS/GEM的實作，裡面內建Event和支援動态配置報表Report，資料上報等大量内容。

時刻遵循着最新的協定，走在行業領先。功能全方位考慮清楚，久經考驗。

In many equipment control applications there is a need for a GEM host to modify one or a small set of

process parameters associated with a recipe. The number of parameters modified, frequency of modification (e.g.,

wafer-to-wafer, batch-to-batch, etc.), range of modification, etc., is largely a function of the equipment control

application. Utilizing GEM, at least two methods are envisioned for modifying process parameters on a tool. With the

first method, ‘Equipment Constants’ can be used to relate process parameters of the updated recipe. Equipment

Constants can also be used in a mode where they relate suggested modifications to process parameters from the stored

recipe; that is, the constants contain only the ± differential from a nominal value. The former mode is preferred because

it better ensures data integrity between the controller and tool. With the second method the entire recipe could be

downloaded, but this results in an enormous amount of communication overhead. Note that, in all cases, the Equipment

Constants do not replace the process parameters inside a recipe, but are associated with (e.g., linked to) these

parameters to relate modifications. The remainder of this application note provides a description of how process

parameter modification can be implemented using existing GEM capabilities. The method may be used in a GEM

compliant system provided that the specific GEM capabilities described are supported.

The equipment constants should represent the actual values of the process parameters with which they are

associated. Depending on the equipment operation and control application, the equipment constant could represent

the actual value of a process parameter at a recipe step, or over the entire recipe. The equipment constants could also

be utilized to represent the differentials of process parameters from nominal values. However it is important to note

that, when using differential values to relate process parameter modifications, any loss of synchronization between

equipment and host could result in an incorrect assessment of the value of a process setpoint by the host. Note also

that, upon system startup, and whenever the appropriate process parameters are modified, the equipment constants

should also be modified as necessary to always reflect the (absolute or relative) values of the associated process

parameters.

NOTICE: This Related Information is not an official part of SEMI E19.3 and was derived from the work of the

Physical Interfaces & Carriers Global Technical Committee. This Related Information was approved for publication

by full letter ballot procedures on August 22, 2013.

NOTE 1: The material contained in this Related Information is not intended to modify or supersede the Standard SEMI E19.3 in

any way. These notes are provided as a source of information to aid in the application of the Standard, and are to be considered

reference material. Determination of the suitability of the material is solely the responsibility of the user.

R1-1.1 A Related Information to SEMI E19 provides the position of existing reticle SMIF pod (RSP150) sensors and

implementation advice. The users of this Standard are recommended to consult this Related Information for reticle

SMIF pod detection.

NOTICE: SEMI makes no warranties or representations as to the suitability of the Standards and Safety Guidelines

set forth herein for any particular application. The determination of the suitability of the Standard or Safety Guideline

is solely the responsibility of the user. Users are cautioned to refer to manufacturer’s instructions, product labels,

product data sheets, and other relevant literature, respecting any materials or equipment mentioned herein. Standards

and Safety Guidelines are subject to change without notice.

By publication of this Standard or Safety Guideline, SEMI takes no position respecting the validity of any patent rights

or copyrights asserted in connection with any items mentioned in this Standard or Safety Guideline. Users of this

Standard or Safety Guideline are expressly advised that determination of any such patent rights or copyrights, and the

risk of infringement of such rights are entirely their own responsibility.

5.3.1 The actual shape of these curves and time intervals is dependent on the design of the MFC under test, the

elastomer used, if any, and the characteristics of the leak detection system. These time intervals must be determined

using sound engineering judgment following qualification testing of the specific MFC model and test set-up. Once

determined, it is recommended that receiving inspection consist of measuring for leak rate value w1 at the end of

interval t2.

5.3.2 Following qualification testing, report typical values for t1 through t4 and w1 and w2. w1 is primarily the

mechanical portion of the leak, and w2 is mechanical plus permeation. In the case where w2 is significantly greater

than w1, w2 is primarily permeation. In the case of a gross mechanical leak, w1 could greatly exceed, and thereby

mask, w2.

NOTE 4: To prevent false leak rate readings that could arise from helium permeation, this test should be performed with elastomers

that were not previously exposed to helium. If exposed to helium, the MFC must be purged of helium by the passage of time and/or

baking.

5.3.3 In good leak testing practice, the background level should be verified before the application of helium to ensure

that the elastomers are in a helium degassed state and that the leak detecting system is in proper operation.

5.2.3 Control Valve Seat Leak Test — The purpose of this test is to determine the leakage through the control valve

under simulated operation in the closed control mode. The MFC should be electrically energized for normal operation

and placed in the closed position as specified for the operation of the MFC. The input pressure to the MFC should be

100 kPa ± 20%. The outlet should be connected directly to the helium leak detector, and pressure should be as low as

possible using good leak detector practice (see Figure 3).

5.1 General Requirements

5.1.1 Leak Detector — The leak detector shall be of the helium mass spectrometer type. It shall have sensitivity at

least equal to or smaller than the specified leak rating of the MFC to be tested. If the actual leak rate is to be reported,

the sensitivity shall be five times smaller than the leak to be measured. If the sensitivity is not five times smaller, the

actual leak rate may be reported if the sensitivity of the detector is also reported.

5.1.2 Helium must have access to all primary seals.

5.1.3 Connections between the MFC and the leak detector must be leak-tight.

5.1.4 The ambient temperature of the MFC should be 25°C ± 5°C unless otherwise specified. If another test

temperature is used, it must be recorded during the test.

5.2 Test Procedures — There are two basic setups which may be used to measure the leak rate from the external

environment to the internal gas passages of the MFC or from the internal passages to the external environment. Results

for either test method may be reported. The method used must be reported as well. A third test, the through-the-valve

setup, is intended to measure the quality of the valve seat shutoff.

5.2.1 Internally-Pressurized Leak Test — The purpose of this test set-up is to simulate operation of the MFC under

conditions where the internal pressure is above ambient. The recommended internal pressure is 300 kPa absolute

(30 psig) of helium (see Figure 1).