Recently, it has been widely rumored on the Internet that Tsinghua University has broken through the EUV lithography machine project, realized the huge lithography machine, and the factory has also landed in Xiong'an New Area, which is like this in the figure below:
Is this really a domestic lithography machine factory?
No, the Chinese Academy of Electronics has made a detailed interpretation of this:
This is the Beijing High Energy Synchrotron Radiation Light Source Project (HEPS)!
Located on the shores of Yanqi Lake in Huairou, Beijing, HEPS is a major national "13th Five-Year Plan" scientific and technological infrastructure.
It is the first high-energy synchrotron radiation light source in mainland China and one of the world's brightest fourth-generation synchrotron radiation light sources, which began construction as early as 2019 and will be put into use by the end of 2025.
△Real photo of Beijing high-energy synchrotron radiation light source project
The HEPS works by accelerating the electron beam to 6 GeV through an accelerator and then injecting it into a storage ring with a circumference of 1360 meters, keeping it running at nearly the speed of light.
When the electron beam passes through the bending magnet or various inserts at different positions of the storage ring, it will release stable, high-energy, high-brightness light along the tangent of the deflection track, that is, synchrotron radiation light.
Simply put, HEPS can be seen as an ultra-precise, ultra-high-speed, powerful penetrating giant X-ray machine.
The small beam it produces can penetrate the material and go deep into the interior for stereoscopic scanning, and observe the microscopic world from the molecular and atomic scales in multiple dimensions.
HEPS is a big scientific device for scientific experiments, not a lithography machine factory transmitted on the Internet.
The project is led by Lou Yu, a national survey and design master and chief scientist of SDIC Group, and cooperated with multiple technical research and design teams of the Chinese Institute of Electronics.
From the project feasibility to the project landing, the China Institute of Electronics has overcome a number of technical and technological difficulties, solved seven technical problems such as uneven settlement, micro-vibration control, ultra-long structure design, photovoltaic panel design, precision temperature control, process circulating cooling water system, and ultra-complex process system, achieved major technological breakthroughs, and index control reached the international advanced level.
At present, the supporting project of high-energy synchrotron radiation light source has been fully completed, and it is one step closer to producing the world's brightest" light.
Although HEPS is not a lithography factory, the reason why the information about the lithography factory can be quickly brushed on the self-media platform is, in the final analysis, due to the public's expectation of solving the "stuck neck" problem.
The China Institute of Electronics is also helping the "China Core" road to continue to make efforts, from the beginning of the establishment of the Institute, it has opened the beginning of China's "Core".
In recent years, the China Institute of Electronics has deeply cultivated the semiconductor industry and undertaken more than 50% of domestic memory chip projects, making important contributions to the country's realization of scientific and technological self-reliance and self-improvement in the field of electronic information.
The China Institute of Electronics has independently developed core algorithms and digital technologies, and has launched the "Advanced Electronics Manufacturing Digital Twin Factory Solution Version 1.0", committed to achieving the construction goal of "green, low-carbon, lean and efficient" in manufacturing.
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